Report date: Apr 21,2026 Conflict count: 377241 Publisher: Institute of Electrical and Electronics Engineers Title count: 12 Conflict count: 81 ========================================================== Created: 2026-04-16 19:52:38 ConfID: 8781337 CauseID: 1742181133 OtherID: 1742181129 JT: IEEE Transactions on Plasma Science MD: ,54,4,2,2026,Transactions on Plasma Science DOI: 10.1109/TPS.2026.3679157(Journal) (8781337-N) DOI: 10.1109/TPS.2026.3679149(Journal) DOI: 10.1109/TPS.2026.3679205(Journal) ========================================================== Created: 2026-04-16 19:52:38 ConfID: 8781336 CauseID: 1742181133 OtherID: 1742181129 JT: IEEE Transactions on Plasma Science MD: ,54,4,1,2026,Table of Contents DOI: 10.1109/TPS.2026.3679155(Journal) (8781336-N) DOI: 10.1109/TPS.2026.3679147(Journal) DOI: 10.1109/TPS.2026.3679163(Journal) ========================================================== Created: 2026-04-16 19:52:38 ConfID: 8781338 CauseID: 1742181133 OtherID: 1742181129 JT: IEEE Transactions on Plasma Science MD: ,54,4,3,2026,IEEE Transactions on Plasma Science information for authors DOI: 10.1109/TPS.2026.3679159(Journal) (8781338-N) DOI: 10.1109/TPS.2026.3679151(Journal) DOI: 10.1109/TPS.2026.3679207(Journal) ========================================================== Created: 2026-04-16 19:52:38 ConfID: 8781356 CauseID: 1742181133 OtherID: 1742181130 JT: IEEE Transactions on Plasma Science MD: ,54,4,4,2026,Blank Page DOI: 10.1109/TPS.2026.3679161(Journal) (8781356-N) DOI: 10.1109/TPS.2026.3679153(Journal) DOI: 10.1109/TPS.2026.3679209(Journal) ========================================================== Created: 2026-03-17 20:22:57 ConfID: 8701416 CauseID: 1737620681 OtherID: 1737620682 JT: IEEE Transactions on Plasma Science MD: ,54,3,4,2026,Blank Page DOI: 10.1109/TPS.2026.3669327(Journal) (8701416-N) DOI: 10.1109/TPS.2026.3670997(Journal) ========================================================== Created: 2026-03-17 20:22:58 ConfID: 8701436 CauseID: 1737620682 OtherID: 1737620681 JT: IEEE Transactions on Plasma Science MD: ,54,3,3,2026,IEEE Transactions on Plasma Science information for authors DOI: 10.1109/TPS.2026.3669325(Journal) (8701436-N) DOI: 10.1109/TPS.2026.3670995(Journal) ========================================================== Created: 2026-03-17 20:22:58 ConfID: 8701437 CauseID: 1737620682 OtherID: 1737620681 JT: IEEE Transactions on Plasma Science MD: ,54,3,2,2026,Transactions on Plasma Science DOI: 10.1109/TPS.2026.3670993(Journal) (8701437-N) DOI: 10.1109/TPS.2026.3669323(Journal) ========================================================== Created: 2026-03-17 20:22:58 ConfID: 8701438 CauseID: 1737620682 OtherID: 1737620681 JT: IEEE Transactions on Plasma Science MD: ,54,3,1,2026,Table of Contents DOI: 10.1109/TPS.2026.3670991(Journal) (8701438-N) DOI: 10.1109/TPS.2026.3669321(Journal)